įunding: The authors received no specific funding for this work.Ĭompeting interests: The authors have declared that no competing interests exist.Ītomic Layer Deposition (ALD) is a technique for depositing thin, conformal films with high control over the thickness that relies on the self-limited interaction of gaseous precursors with the growth surface. ![]() The authors did not have any special access privileges and others would be able to access the data in the same manner as the authors, provided that they have a subscription to Web of Science. The work is made available under the Creative Commons CC0 public domain dedication.ĭata Availability: Restrictions apply to the availability of the raw bibliometric data, which was extracted from Clarivate Analytics Web of Science. This is an open access article, free of all copyright, and may be freely reproduced, distributed, transmitted, modified, built upon, or otherwise used by anyone for any lawful purpose. Received: MaAccepted: NovemPublished: January 10, 2018 ![]() PLoS ONE 13(1):Įditor: Sergi Lozano, Institut Català de Paleoecologia Humana i Evolució Social (IPHES), SPAIN Citation: Alvaro E, Yanguas-Gil A (2018) Characterizing the field of Atomic Layer Deposition: Authors, topics, and collaborations.
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